EFFECT OF POSTANNEALING ON THE OXYGEN PRECIPITATION AND INTERNAL GETTERING PROCESS IN N/N+ (100) EPITAXIAL WAFERS

被引：9
|
作者：
WIJARANAKULA, W
MATLOCK, JH
MOLLENKOPF, H
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 12期
关键词：
D O I：
10.1149/1.2095513
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：3113 / 3119
页数：7
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