HOLLOW-CATHODE ION-SOURCE FOR APPLICATION TO AN IMPLANTER

被引：5
|
作者：
TONEGAWA, A [1 ]
YABE, E [1 ]
SATOH, D [1 ]
TAKAYAMA, K [1 ]
TAKAGI, K [1 ]
FUKUI, R [1 ]
WATANABE, K [1 ]
OKAMOTO, K [1 ]
KOMIYA, S [1 ]
机构：
[1] ULVAC CORP,DIV RES & DEV,CHIGASAKI,JAPAN
来源：
VACUUM | 1986年 / 36卷 / 1-3期
关键词：
D O I：
10.1016/0042-207X(86)90261-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：15 / 18
页数：4
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