HIGH-EFFICIENCY HIGH REPETITION-RATE KRF EXCIMER LASER

被引：0
|
作者：
HOTTA, K
ARAI, M
ITO, S
机构：
来源：
NEC RESEARCH & DEVELOPMENT | 1989年 / 93期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1 / 10
页数：10
相关论文
共 50 条
  • [11] Excimer laser with high repetition rate for DUV lithography
    Patzel, R
    Bragin, I
    Kleinschmidt, J
    Rebhan, U
    Basting, D
    [J]. MICROELECTRONIC ENGINEERING, 1996, 30 (1-4) : 165 - 167
  • [12] High repetition rate ArF excimer laser for microlithography
    Wakabayashi, O
    Enami, T
    Ishii, K
    Terashima, K
    Itakura, Y
    Watanabe, T
    Ohta, T
    Ohbu, A
    Kubo, H
    Tanaka, H
    Andou, S
    Matsunga, T
    Umeda, H
    Suzuki, T
    Sumitani, A
    Mizoguchi, H
    [J]. 1ST INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION, 2000, 4088 : 191 - 194
  • [13] High-repetition rate excimer laser for micromachining
    Herbst, L
    Klaft, I
    Wenzel, T
    Rebhan, U
    [J]. GAS AND CHEMICAL LASERS AND INTENSE BEAM APPLICATIONS IV, 2003, 4971 : 87 - 95
  • [14] HIGH-EFFICIENCY SHORT-PULSE KRF LASER
    OOMEN, GL
    WITTEMAN, WJ
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1980, 70 (06) : 673 - 673
  • [15] High Intensity, High Temporal Contrast, High repetition-rate Laser for Laser Driven Particle Acceleration
    Suzuki, M.
    Kiriyama, H.
    Daito, I.
    Okada, H.
    Ochi, Y.
    Sato, M.
    Yoshii, T.
    Tamaoki, Y.
    Maeda, J.
    Matsuoka, S.
    Kan, H.
    Bolton, P. R.
    Sugiyama, A.
    Kondo, K.
    Kawanishi, S.
    [J]. LASER-DRIVEN RELATIVISTIC PLASMAS APPLIED TO SCIENCE, ENERGY, INDUSTRY, AND MEDICINE, 2012, 1465 : 53 - 57
  • [16] Beam quality of a XeCl excimer laser vs. the repetition-rate
    Di Lazzaro, P
    Bollanti, S
    Bonfigli, F
    Flora, F
    Letardi, T
    Murra, D
    [J]. ADVANCED HIGH-POWER LASERS, 2000, 3889 : 379 - 387
  • [17] High-efficiency femtosecond ablation of silicon with GHz repetition rate laser source
    Mishchik, Konstantin
    Bonamis, Guillaume
    Qiao, Jie
    Lopez, John
    Audouard, Eric
    Mottay, Eric
    Honninger, Clemens
    Manek-Honninger, Inka
    [J]. OPTICS LETTERS, 2019, 44 (09) : 2193 - 2196
  • [18] 2.5 KHZ HIGH REPETITION RATE XECL EXCIMER LASER
    TAKAGI, S
    OKAMOTO, N
    KAKIZAKI, K
    SATO, S
    GOTO, T
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 68 (11) : 5927 - 5929
  • [19] High-efficiency 2 kW XeCl excimer laser
    K. Haruta
    Y. Saito
    M. Inoue
    Y. Sato
    S. Fujikawa
    A. Suzuki
    H. Nagai
    [J]. Applied Physics B, 1999, 68 : 663 - 669
  • [20] High-efficiency 2 kW XeCl excimer laser
    Haruta, K
    Saito, Y
    Inoue, M
    Sato, Y
    Fujikawa, S
    Suzuki, A
    Nagai, H
    [J]. APPLIED PHYSICS B-LASERS AND OPTICS, 1999, 68 (04): : 663 - 669
12345