ION-IMPLANTATION SYSTEM FOR NEAR-SURFACE STUDIES

被引：0

作者：

VIRDI, GS ^{[1
]}

NATH, N ^{[1
]}

机构：

[1] KURUKSHETRA UNIV,DEPT PHYS,KURUKSHETRA 132119,HARYANA,INDIA

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1995年 / 66卷 / 11期

关键词：

D O I：

10.1063/1.1146092

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

An ion-implantation system designed and fabricated indigenously is described. It consists of a versatile ion source, Einzel lens system, EXH velocity filter, dose measuring equipment, and target chamber. The ion-implantation system fabricated has been used to prepare ion-implanted luminescent phosphors by implanting Sb+ ions into CaS. (C) 1995 American Institute of Physics.

引用

页码：5244 / 5248

页数：5

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