SURFACE-ANALYSIS FOR SI-WAFERS USING TOTAL REFLECTION X-RAY-FLUORESCENCE ANALYSIS

被引：21
|
作者：
BERNEIKE, W [1 ]
KNOTH, J [1 ]
SCHWENKE, H [1 ]
WEISBROD, U [1 ]
机构：
[1] GESELL KERNENERGIEVERWERTUNG SCHIFFBAU SCHIFFAHRT,FORSCHUNGSZENTRUM GEESTHACHT GMBH,D-2054 GEESTHACHT,FED REP GER
来源：
FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE | 1989年 / 333卷 / 4-5期
关键词：
D O I：
10.1007/BF00572369
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
引用
收藏
页码：524 / 526
页数：3
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