REDUCTION OF PHOTORESIST STANDING-WAVE EFFECTS BY POST-EXPOSURE BAKE

被引：71
|
作者：
WALKER, EJ [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 1975年 / ED22卷 / 07期
关键词：
D O I：
10.1109/T-ED.1975.18162
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：464 / 466
页数：3
相关论文
共 50 条
  • [31] EFFECTS OF EXPOSURE TO A TILTED ROOM ON KINESTHETIC POST-EXPOSURE RESPONSES
    WALLACE, M
    SINGER, G
    MOTTRAM, J
    PURCELL, T
    PERCEPTION, 1975, 4 (04) : 447 - 451
  • [32] Effects of post-exposure naps on exposure therapy for social anxiety
    Pace-Schott, Edward F.
    Bottary, Ryan M.
    Kim, Se-Yun
    Rosencrans, Peter L.
    Vijayakumar, Shilpa
    Orr, Scott P.
    Lasko, Natasha B.
    Goetter, Elizabeth M.
    Baker, Amanda W.
    Bianchi, Matt T.
    Gannon, Karen
    Hoeppner, Susanne S.
    Hofmann, Stefan G.
    Simon, Naomi M.
    PSYCHIATRY RESEARCH, 2018, 270 : 523 - 530
  • [33] Heat Conduction to Photoresist on Top of Wafer during Post Exposure Bake Process: II. Application
    Oh, Hye-Keun
    Kim, Do Wan
    Lee, Ji-Eun
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (11) : 8349 - 8353
  • [34] Optimal temperature-time condition for the post-exposure bake process of deep-UV resists
    Li, TL
    Ting, JH
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2001, 40 (3B): : L259 - L261
  • [35] Global CD uniformity improvement for CAR masks by adaptive post-exposure bake with CD measurement feedback
    Berger, L
    Saule, W
    Dress, P
    Gairing, T
    Chen, CJ
    Lee, HC
    Hsieh, HC
    PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XI, 2004, 5446 : 148 - 154
  • [36] Post-exposure delay stability for 193 nm single-layer photoresist: Solvent effect
    Hwang, SH
    Jung, JC
    JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS, 2000, 38 (01) : 148 - 153
  • [37] Submillisecond post-exposure bake of chemically amplified resists by CO2 laser spike annealing
    Sha, Jing
    Jung, Byungki
    Thompson, Michael O.
    Ober, Christopher K.
    Chandhok, Manish
    Younkin, Todd R.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2009, 27 (06): : 3020 - 3024
  • [38] Transient characteristics and thermal boundary effects in standing-wave thermoacoustic refrigerators
    Zhang, Zhuoyuan
    Li, Keqiao
    Ji, Jiacheng
    Chen, Qiyu
    Huang, Baoling
    INTERNATIONAL JOURNAL OF HEAT AND MASS TRANSFER, 2025, 236
  • [39] Evaluation of the new-type ESPACER adopted for its removal after Post-Exposure Bake Process
    Saida, Y
    Okubo, T
    Sasaki, J
    Konishi, T
    Morita, M
    Photomask and Next-Generation Lithography Mask Technology XII, Pts 1 and 2, 2005, 5853 : 484 - 492
  • [40] The Study of CD Side to Side Error in Line/Space Pattern Caused by Post-Exposure Bake Effect
    Huang, Jin
    Guo, Eric
    Ge, Haiming
    Lu, Max
    Wu, Yijun
    Tian, Mingjing
    Yan, Shichuan
    Wang, Ran
    PHOTOMASK TECHNOLOGY 2016, 2016, 9985
12345