REDUCTION OF PHOTORESIST STANDING-WAVE EFFECTS BY POST-EXPOSURE BAKE

被引：71
|
作者：
WALKER, EJ [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HEIGHTS,NY 10598
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 1975年 / ED22卷 / 07期
关键词：
D O I：
10.1109/T-ED.1975.18162
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：464 / 466
页数：3
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