CREEP IN POLYCRYSTALLINE AL2O3-SI

被引:0
|
作者
HOU, LD [1 ]
KROGER, FA [1 ]
机构
[1] UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089
关键词
D O I
10.1007/BF00720338
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:993 / 996
页数:4
相关论文
共 50 条
  • [1] LUMINESCENCE AND COLOR-CENTERS IN AL2O3-SI,TI
    MEHTA, SK
    SENGUPTA, S
    NUCLEAR INSTRUMENTS & METHODS, 1979, 164 (02): : 349 - 354
  • [2] EFFECT OF RADIATION IN REACTIVELY SPUTTERED AL2O3-SI STRUCTURES
    HATTORI, T
    IWAUCHI, S
    TANAKA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1970, 9 (12) : 1538 - &
  • [3] INTERFACE CHARACTERISTICS OF REACTIVELY SPUTTERED AL2O3-SI STRUCTURE
    TANAKA, T
    IWAUCHI, S
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1969, 8 (06) : 730 - +
  • [4] CREEP OF DOPED POLYCRYSTALLINE AL2O3
    SUGITA, T
    PASK, JA
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1970, 53 (11) : 609 - &
  • [5] AL2O3 FILM GROWN BY CVD AND THE INTERFACE CHARACTERISTICS OF AL2O3-INP AND AL2O3-SI
    YUAN, RK
    XU, JM
    CHINESE PHYSICS, 1985, 5 (02): : 522 - 526
  • [6] Synthesis and Characterization of In Situ (Al2O3-Si)/Al Composites by Reaction Hot Pressing
    Mokhnache, El Oualid
    Wang, Guisong
    Geng, Lin
    Kaveendran, Balasubramaniam
    Huang, Lujun
    ACTA METALLURGICA SINICA-ENGLISH LETTERS, 2014, 27 (05) : 930 - 936
  • [7] High-Temperature Reaction of Al2O3-Si in Reduction Atmosphere
    Zhu Hongxi
    Deng Chengji
    Li Junying
    Bai Chen
    RARE METAL MATERIALS AND ENGINEERING, 2008, 37 : 130 - 133
  • [8] Properties and Microstructure Evolution of Al2O3-Si Material Fired in Different Atmospheres
    MA Teng
    LIU Xinhong
    ZHU Xiaoyan
    YE Fangbao
    China'sRefractories, 2014, 23 (02) : 30 - 34
  • [9] CREEP DEFORMATION OF AL-AL2O3 AND AL-AL2O3-SI ALLOYS
    MATSUURA, K
    MATSUDA, N
    JOURNAL OF THE JAPAN INSTITUTE OF METALS, 1984, 48 (05) : 504 - 512
  • [10] EFFECT OF HEAT TREATMENT ON INTERFACE CHARACTERISTICS IN REACTIVELY SPUTTERED AL2O3-SI STRUCTURES
    HATTORI, T
    IWAUCHI, S
    NAGANO, K
    TANAKA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1971, 10 (02) : 203 - &