THE GA-AS-H-CL VAPOR-PHASE EPITAXIAL-GROWTH SYSTEM

被引：2
|
作者：
HAN, HG
RAO, YK
机构：
来源：
METALLURGICAL TRANSACTIONS B-PROCESS METALLURGY | 1985年 / 16卷 / 01期
关键词：
D O I：
10.1007/BF02657494
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
引用
收藏
页码：97 / 105
页数：9
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