RESISTS FOR ELECTRON-BEAM LITHOGRAPHY

被引：0

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作者：

TAMAMURA, T

IMAMURA, S

SUGAWARA, S

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来源：

ACS SYMPOSIUM SERIES | 1984年 / 242卷

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暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

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页码：103 / 118

页数：16

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