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NOVEL SUBMICROMETER MOS DEVICES BY SELF-ALIGNED NITRIDATION OF SILICIDE
被引:25
|
作者
:
KANEKO, H
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI MICRO COMP ENGN LTD,KODAIRA,TOKYO 187,JAPAN
KANEKO, H
KOYANAGI, M
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI MICRO COMP ENGN LTD,KODAIRA,TOKYO 187,JAPAN
KOYANAGI, M
SHIMIZU, S
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI MICRO COMP ENGN LTD,KODAIRA,TOKYO 187,JAPAN
SHIMIZU, S
KUBOTA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI MICRO COMP ENGN LTD,KODAIRA,TOKYO 187,JAPAN
KUBOTA, Y
KISHINO, S
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI MICRO COMP ENGN LTD,KODAIRA,TOKYO 187,JAPAN
KISHINO, S
机构
:
[1]
HITACHI MICRO COMP ENGN LTD,KODAIRA,TOKYO 187,JAPAN
[2]
HITACHI LTD,MUSASHI WORKS,KODAIRA,TOKYO 187,JAPAN
来源
:
IEEE TRANSACTIONS ON ELECTRON DEVICES
|
1986年
/ 33卷
/ 11期
关键词
:
D O I
:
10.1109/T-ED.1986.22731
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:1702 / 1709
页数:8
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