CHEMICAL VAPOR-DEPOSITION OF RUTHENIUM

被引：0

|

作者：

GROSS, ME ^{[1
]}

PAPA, LE ^{[1
]}

GREEN, ML ^{[1
]}

SCHNOES, KJ ^{[1
]}

机构：

[1] AT & T BELL LABS,MURRAY HILL,NJ

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：C88 / C88

页数：1

相关论文

共 50 条

[41] CHEMICAL VAPOR-DEPOSITION OF CERAMIC MATERIALS
BLOCHER, JM
AMERICAN CERAMIC SOCIETY BULLETIN, 1980, 59 (03): : 329 - 329
[42] CHEMICAL VAPOR-DEPOSITION AND ISOTOPE SEPARATION
SEVERIN, PJ
LYDTIN, H
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (01) : 140 - 147
[43] CHEMICAL VAPOR-DEPOSITION OF MOLYBDENUM ON GRAPHITE
MIYAKE, M
HIROOKA, Y
IMOTO, T
SANO, T
THIN SOLID FILMS, 1980, 72 (02) : 247 - 248
[44] COATING OF GLASS BY CHEMICAL VAPOR-DEPOSITION
BLOCHER, JM
THIN SOLID FILMS, 1981, 77 (1-3) : 51 - 63
[45] MODELING OF CHEMICAL VAPOR-DEPOSITION REACTORS
SHERMAN, A
JOURNAL OF ELECTRONIC MATERIALS, 1988, 17 (05) : 413 - 423
[46] PRECURSORS FOR CHEMICAL VAPOR-DEPOSITION OF COPPER
KUMAR, R
MAVERICK, AW
FRONCZEK, FR
LAI, G
GRIFFIN, GL
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 201 : 256 - INOR
[47] CHEMICAL VAPOR-DEPOSITION ADVANCES SUPERCONDUCTORS
SWINBANKS, D
NATURE, 1988, 332 (6162) : 295 - 295
[48] SELECTIVE ALUMINUM CHEMICAL VAPOR-DEPOSITION
TSUBOUCHI, K
MASU, K
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04): : 856 - 862
[49] CHEMICAL VAPOR-DEPOSITION FOR MICROELECTRONIC DEVICES
JENSEN, K
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1985, 190 (SEP): : 77 - INE
[50] CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE
TAKAHASHI, T
KAMIYA, H
JOURNAL OF CRYSTAL GROWTH, 1974, 26 (02) : 203 - 209

← 1 2 3 4 5 →