Built-in electric field thickness design for betavoltaic batteries

被引:2
|
作者
Chen Haiyang [1 ]
Li Darang [1 ]
Yin Jianhua [1 ]
Cai Shengguo [1 ]
机构
[1] Beijing Inst Technol, Sch Mech Engn, Beijing 100081, Peoples R China
基金
中国国家自然科学基金;
关键词
betavoltaic battery; built-in electric field; electron-hole pair recombination; energy deposition;
D O I
10.1088/1674-4926/32/9/094009
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Isotope source energy deposition along the thickness direction of a semiconductor is calculated, based upon which an ideal short current is evaluated for betavoltaic batteries. Electron-hole pair recombination and drifting length in a PN junction built-in electric field are extracted by comparing the measured short currents with the ideal short currents. A built-in electric field thickness design principle is proposed for betavoltaic batteries: after measuring the energy deposition depth and the carrier drift length, the shorter one should then be chosen as the built-in electric field thickness. If the energy deposition depth is much larger than the carrier drift length, a multi-junction is preferred in betavoltaic batteries and the number of the junctions should be the value of the deposition depth divided by the drift length.
引用
收藏
页数:4
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