共 50 条
- [33] CHARACTERIZATION AND CONTROL OF LASER-PLASMA FLUX PARAMETERS FOR SOFT-X-RAY PROJECTION LITHOGRAPHY [J]. APPLIED OPTICS, 1993, 32 (34): : 6901 - 6910
- [34] SOFT-X-RAY LITHOGRAPHY USING SYNCHROTRON RADIATION [J]. FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1989, 25 (04): : 317 - 324
- [35] SOFT-X-RAY MICROSCOPY AND LITHOGRAPHY WITH SYNCHROTRON RADIATION [J]. NUCLEAR INSTRUMENTS & METHODS, 1978, 152 (01): : 279 - 288
- [36] SOFT-X-RAY PROJECTION - THROUGH A GLASS DARKLY [J]. SOLID STATE TECHNOLOGY, 1994, 37 (06) : 52 - &
- [37] Soft X-ray projection lithography technology [J]. Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams, 2000, 12 (05): : 559 - 564
- [38] RADIATION HARDNESS OF MOLYBDENUM SILICON MULTILAYERS DESIGNED FOR USE IN A SOFT-X-RAY PROJECTION LITHOGRAPHY SYSTEM [J]. APPLIED OPTICS, 1993, 32 (34): : 6991 - 6998
- [40] SOFT-X-RAY REDUCTION LITHOGRAPHY USING MULTILAYER MIRRORS [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1991, 30 (11B): : 3048 - 3052