A MATHEMATICAL-MODEL FOR DETERMINING FILM THICKNESS OF PHOTORESISTS

被引:0
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作者
FERGUSON, S [1 ]
GALLANT, K [1 ]
LINDSAY, W [1 ]
机构
[1] ALLIED CORP,BUFFALO RES LAB,BUFFALO,NY 14210
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O6 [化学];
学科分类号
0703 ;
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页码:11 / ACSC
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