Spin synthesis of monolayer of SiO2 thin films

The highly ordered monolayer of submicron size silica (SiO2) particles (235 nm) is developed on p-silicon by using three-step spin-coating in colloidal suspension, which has significant potential in various applications. The influence of three-step spin speeds, spinning time, acceleration time between different steps, concentration of SiO2 particles in the solution, solution quantity, and the ambient humidity (relative humidity) on the properties of monolayer SiO2 are studied in order to achieve a large area monolayer film. A relatively high surface coverage and uniform monolayer film of SiO2 particles in the range of 85%-90% are achieved by appropriate control of the preparative parameters. We conclude that this method can be useful in industrial applications, because of the fabrication speed, surface coverage and cost of the process.