MODELING OF LOW-PRESSURE CVD PROCESSES

被引：64

|

作者：

KUIPER, AET

VANDENBREKEL, CJH

DEGROOT, J

VELTKAMP, GW

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 10期

关键词：

D O I：

10.1149/1.2123495

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：2288 / 2291

页数：4

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