CHARACTERIZATION OF WNX METALLIZATION PREPARED BY ION-IMPLANTATION OF NITROGEN

被引:1
|
作者
GREGUSOVA, D
LALINSKY, T
MOZOLOVA, Z
MACHAJDIK, D
POCHABA, I
VAVRA, I
PORGES, M
机构
[1] Institute of Electrical Engineering, Slovak Academy of Sciences, 842 39 Bratislava
关键词
D O I
10.1016/0040-6090(94)90771-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The thermal stability of the sheet resistance of WNx metallization film prepared by ion implantation of nitrogen into sputtered tungsten film was investigated in correlation with microstructural changes examined by X-ray and transmission electron microscopy. The effect of microstructural properties on the sheet resistivity of the metallization film was demonstrated.
引用
收藏
页码:250 / 253
页数:4
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