A NEW DOPING METHOD USING METALORGANICS IN CHEMICAL VAPOR-DEPOSITION OF 6H-SIC

被引：11
|
作者：
YOSHIDA, S
SAKUMA, E
MISAWA, S
GONDA, S
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 01期
关键词：
D O I：
10.1063/1.332859
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：169 / 171
页数：3
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