PRODUCTION OF A HIGH-DENSITY AND HIGH-TEMPERATURE PLASMA WITH AN INTENSE HIGH-CONTRAST SUBPICOSECOND LASER

被引：33
|
作者：
CHIEN, CY
COE, JS
MOUROU, G
KIEFFER, JC
CHAKER, M
BEAUDOIN, Y
PEYRUSSE, O
GILLES, D
机构：
[1] INST NATL RECH SCI ENERGIE & MAT,VARENNES J3X 1S2,PQ,CANADA
[2] CEA,CTR ETUD LIMEIL,VILLENEUVE ST GEO,FRANCE
来源：
OPTICS LETTERS | 1993年 / 18卷 / 18期
关键词：
D O I：
10.1364/OL.18.001535
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We report on the observation of high-electron-density (n(e) almost-equal-to 15n(c) where n, is the critical density, 4 x 10(21) cm-3 for lambda = 0.53 mum) and high-temperature (T(e) almost-equal-to 400 eV) plasma obtained when an intense high-contrast 400-fs laser pulse interacts with a solid Al target. After the laser intensity is increased from 10(16) to 5 x 10(17) W/cm2, the kiloelectron-volt x-ray emission is brighter by approximately an order of magnitude and is still produced from very dense plasma (6 x 10(22) cm-3).
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收藏
页码：1535 / 1537
页数：3
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