INFRARED REFLECTANCE OF THIN ALUMINUM NITRIDE FILMS ON VARIOUS SUBSTRATES

被引：34
|
作者：
MACMILLAN, MF
DEVATY, RP
CHOYKE, WJ
机构：
[1] Department of Physics and Astronomy, University of Pittsburgh, Pittsburgh
来源：
APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 07期
关键词：
D O I：
10.1063/1.108595
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The measured room-temperature infrared reflectance at near-normal incidence of thin AlN films deposited by metalorganic chemical vapor deposition on various substrates is compared with calculated spectra based on Lorentz oscillator models for the reststrahl regions with parameters obtained from the literature. The effects of film and substrate anisotropy and non-normal incidence are included. The contribution of AlN can be analyzed even when the substrate and/or a thin overlayer have overlapping reflection bands. It is possible to obtain information on the thickness and other properties of the AlN films.
引用
收藏
页码：750 / 752
页数：3
相关论文
共 50 条
  • [1] Correlation between the infrared reflectance and microstructure of thin gallium nitride films grown on silicon substrates
    Hou, YT
    Feng, ZC
    Chen, J
    Zhang, X
    Chua, SJ
    Lin, JY
    [J]. SOLID STATE COMMUNICATIONS, 2000, 115 (01) : 45 - 49
  • [2] INFRARED TRANSMITTANCE OF THIN ALUMINUM FILMS ON COLLODION SUBSTRATES
    BRETT, DA
    SULLIVAN, EJ
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1965, 55 (11) : 1556 - &
  • [3] Nanoindentation characterization of aluminum nitride thin films on sapphire substrates
    Schneider, JA
    McCarty, KF
    Heffelfinger, JR
    Moody, NR
    [J]. INTEGRATED THIN FILMS AND APPLICATIONS, 1998, 86 : 255 - 263
  • [4] Morphology and structure of aluminum nitride thin films on glass substrates
    Cheng, CC
    Chen, YC
    Wang, HJ
    Chen, WR
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (03): : 1880 - 1885
  • [5] Interfacial reaction between titanium thin films and aluminum nitride substrates
    Imanaka, Y
    Notis, MR
    [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1999, 82 (06) : 1547 - 1552
  • [6] INFRARED REFLECTANCE OF EVAPORATED ALUMINUM FILMS
    BENNETT, HE
    ASHLEY, EJ
    BENNETT, JM
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1962, 52 (11) : 1245 - &
  • [7] CHARACTERIZATION OF THIN ALUMINUM FILMS DEPOSITED ONTO VARIOUS METALLIC SUBSTRATES
    SAVAGE, HS
    RIGSBEE, JM
    [J]. JOURNAL OF METALS, 1988, 40 (07): : A84 - A84
  • [8] Growth of polycrystalline indium aluminum nitride thin films on silicon (111) substrates
    Afzal, Naveed
    Devarajan, Mutharasu
    Ibrahim, Kamarulazizi
    [J]. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2014, 27 : 975 - 984
  • [9] Pulsed photothermal reflectance measurement of the thermal conductivity of sputtered aluminum nitride thin films
    Zhao, YM
    Zhu, CL
    Wang, SG
    Tian, JZ
    Yang, DJ
    Chen, CK
    Cheng, H
    Hing, P
    [J]. JOURNAL OF APPLIED PHYSICS, 2004, 96 (08) : 4563 - 4568
  • [10] Infrared reflectance of extremely thin AlN epi-films deposited on SiC substrates
    MacMillan, MF
    Forsberg, U
    Persson, POA
    Hultman, L
    Janzen, E
    [J]. SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2, 1998, 264-2 : 649 - 652
12345