An experimental method for studying Young's modulus of single crystal silicon at high temperature

被引:1
|
作者
Yao, Shaokang [1 ,2 ]
Xu, Dehui [1 ]
Xiong, Bin [1 ]
Wang, Yuelin [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Transducer Technol, Sci & Technol Microsyst Lab, 865 Changning Rd, Shanghai 200050, Peoples R China
[2] Univ Chinese Acad Sci, Beijing, Peoples R China
关键词
Single crystal silicon; Young's modulus; high temperature; microstructure; deformation;
D O I
10.1177/1740349913485569
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This article reports a novel indirect experimental method to measure Young's modulus of single crystal silicon at high temperature. Young's modulus at high temperature is estimated by measuring the elastic deformation of single crystal silicon microstructure at room temperature and high temperature. Since it is difficult to measure the elastic deformation directly at high temperature, a novel indirect method is presented in this study. In order to prevent plastic deformation at high temperature, the Von Mises yield criterion is applied to predict the onset of plastic deformation. The resulting Young's modulus of single crystal silicon is about 110 +/- 17 GPa at 900 degrees C in the <100> direction from the present experiment.
引用
收藏
页码:176 / 180
页数:5
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