DEVELOPMENT AND APPLICATIONS OF A COMPACT ELECTRON-CYCLOTRON RESONANCE SOURCE

被引：30
|
作者：
OKEEFFE, P
KOMURO, S
DEN, S
MORIKAWA, T
AOYAGI, Y
机构：
[1] TOYO UNIV,FAC ENGN,KAWAGOE,SAITAMA 350,JAPAN
[2] IRIE KOKEN CO LTD,KAWAGOE,SAITAMA 356,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 11B期
关键词：
ECR; ECR SOURCE; ECR PLASMA; RADICAL GUN; RADICAL BEAM; OXIDATION; CLEANING; DEPOSITION; ETCHING; PASSIVATION;
D O I：
10.1143/JJAP.30.3164
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A new compact ECR plasma source has been developed. The characteristics of this source and it's applications are discussed. Irradiation by oxygen radicals O* for the oxidation during deposition process was found to produce high quality superconducting thin films with increased characteristic temperatures. Hydrogen radical H* beam cleaning of GaAs substrate surfaces was achieved at temperatures as low as 100-degrees-C.
引用
收藏
页码：3164 / 3168
页数：5
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