ELECTRICAL TRANSPORT IN RF-SPUTTERED SIO2-FILMS - A REVIEW

被引：6
|
作者：
MEAUDRE, M [1 ]
MEAUDRE, R [1 ]
机构：
[1] UNIV LYON 1, CNRS, DEPT PHYS MAT, F-69622 VILLEURBANNE, FRANCE
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1984年 / 68卷 / 2-3期
关键词：
D O I：
10.1016/0022-3093(84)90012-7
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
142
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页码：281 / 299
页数：19
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