MULTIRING STRUCTURES FOR CONTACT RESISTANCE MEASUREMENTS ON METAL THIN-LAYER SEMICONDUCTORS

被引：0
|
作者：
ZHU, DG
机构：
来源：
SOLID-STATE ELECTRONICS | 1991年 / 34卷 / 10期
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Multi-ring structures were investigated for contact resistance measurements on metal-thin-layer semiconductors. The structures were very simple to prepare and convient to carry out measurements. Very simple expressions were derived for contact resistance. Their application aspects were discussed based on the ring structure dimensions design, the convenience for doing measurements, the simplicity for the contact resistance calculation and the contacts preparation, and the accuracy for the contact resistance determination.
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页码：1165 / 1167
页数：3
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