SPECTROSCOPIC AND STRUCTURAL-PROPERTIES OF LOW-TEMPERATURE NITROGEN DOPED SIO2-FILMS

被引：0
|
作者：
ANDERSON, GW [1 ]
SCHMIDT, WA [1 ]
COMAS, J [1 ]
机构：
[1] USN,RES LAB,WASHINGTON,DC 20375
来源：
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1978年 / 23卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
下载
收藏
页码：455 / 455
页数：1
相关论文
共 50 条
  • [1] LOW-TEMPERATURE SIO2-FILMS
    FALCONY, C
    ORTIZ, A
    LOPEZ, S
    ALONSO, JC
    MUHL, S
    THIN SOLID FILMS, 1990, 193 (1-2) : 638 - 647
  • [2] LOW-TEMPERATURE SIO2-FILMS
    FALCONY, C
    ORTIZ, A
    LOPEZ, S
    ALONSO, JC
    MUHL, S
    THIN SOLID FILMS, 1991, 199 (02) : 269 - 278
  • [3] ELECTRIC AND STRUCTURAL-PROPERTIES OF LOW-TEMPERATURE BISMUTH FILMS
    KOMNIK, YF
    BELEVTSE.BI
    YATSUK, LA
    ZHURNAL EKSPERIMENTALNOI I TEORETICHESKOI FIZIKI, 1972, 63 (12): : 2227 - 2238
  • [4] RHEED INVESTIGATIONS ON LOW-TEMPERATURE THERMAL SIO2-FILMS
    POPOVA, LI
    PENEVA, SK
    TCUKEVA, EA
    ATANASSOVA, ED
    CRYSTAL RESEARCH AND TECHNOLOGY, 1991, 26 (04) : 425 - 432
  • [5] LOW-TEMPERATURE CVD OF SIO2-FILMS USING NOVEL PRECURSORS
    DESU, SB
    PENG, CH
    SHI, T
    AGASKAR, PA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (09) : 2682 - 2685
  • [6] POROUS STRUCTURE OF SIO2-FILMS SYNTHESIZED AT LOW-TEMPERATURE AND PRESSURE
    BAKLANOV, MR
    VASILYEVA, LL
    GAVRILOVA, TA
    DULTSEV, FN
    MOGILNIKOV, KP
    NENASHEVA, LA
    THIN SOLID FILMS, 1989, 171 (01) : 43 - 52
  • [7] LOW-TEMPERATURE SIO2-FILMS DEPOSITED BY PLASMA ENHANCED TECHNIQUES
    ALONSO, JC
    ORTIZ, A
    FALCONY, C
    VACUUM, 1992, 43 (08) : 843 - 847
  • [8] GROWTH AND PROPERTIES OF THIN SIO2-FILMS BY INDUCTIVELY COUPLED LOW-TEMPERATURE PLASMA ANODIZATION
    ZHANG, JF
    TAYLOR, S
    ECCLESTON, W
    NIELD, M
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1990, 5 (08) : 824 - 830
  • [9] LOW-TEMPERATURE PLASMA ASSISTED CVD SIO2-FILMS FOR MIS INFRARED DETECTORS
    SCHMIDT, WA
    REID, PR
    ANDERSON, GW
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C87 - C87
  • [10] ETCHING KINETICS OF THE LOW-TEMPERATURE CHEMICALLY VAPOR-DEPOSITED SIO2-FILMS
    PAVELESCU, C
    COBIANU, C
    SEGAL, E
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1984, 3 (07) : 643 - 646
12345