INSITU ELLIPSOMETRY COMPARISON OF THE NUCLEATION AND GROWTH OF SPUTTERED AND GLOW-DISCHARGE A-SI-H

被引：12
|
作者：
COLLINS, RW
CAVESE, JM
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 10期
关键词：
D O I：
10.1063/1.339132
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：4146 / 4153
页数：8
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