首页
学术期刊
论文检测
AIGC检测
热点
更多
数据
GROWTH OF POLYCRYSTALLINE CDS FILMS BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION
被引:16
|
作者
:
YAMAGA, S
论文数:
0
引用数:
0
h-index:
0
YAMAGA, S
YOSHIKAWA, A
论文数:
0
引用数:
0
h-index:
0
YOSHIKAWA, A
KASAI, H
论文数:
0
引用数:
0
h-index:
0
KASAI, H
机构
:
来源
:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
|
1987年
/ 26卷
/ 07期
关键词
:
D O I
:
10.1143/JJAP.26.1002
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:1002 / 1007
页数:6
相关论文
共 50 条
[31]
FABRICATION OF ALUMINUM-OXIDE THIN-FILMS BY A LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION TECHNIQUE
KIM, JS
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV KENTUCKY,DEPT CHEM,LEXINGTON,KY 40506
KIM, JS
MARZOUK, HA
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV KENTUCKY,DEPT CHEM,LEXINGTON,KY 40506
MARZOUK, HA
REUCROFT, PJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV KENTUCKY,DEPT CHEM,LEXINGTON,KY 40506
REUCROFT, PJ
ROBERTSON, JD
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV KENTUCKY,DEPT CHEM,LEXINGTON,KY 40506
ROBERTSON, JD
HAMRIN, CE
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV KENTUCKY,DEPT CHEM,LEXINGTON,KY 40506
HAMRIN, CE
APPLIED PHYSICS LETTERS,
1993,
62
(07)
: 681
-
683
[32]
ZnS thin films prepared by low-pressure metalorganic chemical vapor deposition
Li, Jiin Wen,
1600,
JJAP, Minato-ku, Japan
(33):
[33]
GROWTH OF GA0.47IN0.53AS-INP QUANTUM WELLS BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION
RAZEGHI, M
论文数:
0
引用数:
0
h-index:
0
机构:
ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS LAB,F-75231 PARIS 05,FRANCE
ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS LAB,F-75231 PARIS 05,FRANCE
RAZEGHI, M
HIRTZ, JP
论文数:
0
引用数:
0
h-index:
0
机构:
ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS LAB,F-75231 PARIS 05,FRANCE
ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS LAB,F-75231 PARIS 05,FRANCE
HIRTZ, JP
ZIEMELIS, UO
论文数:
0
引用数:
0
h-index:
0
机构:
ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS LAB,F-75231 PARIS 05,FRANCE
ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS LAB,F-75231 PARIS 05,FRANCE
ZIEMELIS, UO
DELALANDE, C
论文数:
0
引用数:
0
h-index:
0
机构:
ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS LAB,F-75231 PARIS 05,FRANCE
ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS LAB,F-75231 PARIS 05,FRANCE
DELALANDE, C
ETIENNE, B
论文数:
0
引用数:
0
h-index:
0
机构:
ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS LAB,F-75231 PARIS 05,FRANCE
ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS LAB,F-75231 PARIS 05,FRANCE
ETIENNE, B
VOOS, M
论文数:
0
引用数:
0
h-index:
0
机构:
ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS LAB,F-75231 PARIS 05,FRANCE
ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS LAB,F-75231 PARIS 05,FRANCE
VOOS, M
APPLIED PHYSICS LETTERS,
1983,
43
(06)
: 585
-
587
[34]
GROWTH OF HIGH OPTICAL AND ELECTRICAL QUALITY GAN LAYERS USING LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION
KHAN, MA
论文数:
0
引用数:
0
h-index:
0
机构:
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
KHAN, MA
KUZNIA, JN
论文数:
0
引用数:
0
h-index:
0
机构:
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
KUZNIA, JN
VANHOVE, JM
论文数:
0
引用数:
0
h-index:
0
机构:
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
VANHOVE, JM
OLSON, DT
论文数:
0
引用数:
0
h-index:
0
机构:
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
OLSON, DT
KRISHNANKUTTY, S
论文数:
0
引用数:
0
h-index:
0
机构:
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
KRISHNANKUTTY, S
KOLBAS, RM
论文数:
0
引用数:
0
h-index:
0
机构:
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27695
KOLBAS, RM
APPLIED PHYSICS LETTERS,
1991,
58
(05)
: 526
-
527
[35]
AlN and AlGaN growth using low-pressure metalorganic chemical vapor deposition
Nakamura, F
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Res Ctr, Hodogaya Ku, Yokohama, Kanagawa 240, Japan
Sony Corp, Res Ctr, Hodogaya Ku, Yokohama, Kanagawa 240, Japan
Nakamura, F
Hashimoto, S
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Res Ctr, Hodogaya Ku, Yokohama, Kanagawa 240, Japan
Sony Corp, Res Ctr, Hodogaya Ku, Yokohama, Kanagawa 240, Japan
Hashimoto, S
Hara, M
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Res Ctr, Hodogaya Ku, Yokohama, Kanagawa 240, Japan
Sony Corp, Res Ctr, Hodogaya Ku, Yokohama, Kanagawa 240, Japan
Hara, M
Imanaga, S
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Res Ctr, Hodogaya Ku, Yokohama, Kanagawa 240, Japan
Sony Corp, Res Ctr, Hodogaya Ku, Yokohama, Kanagawa 240, Japan
Imanaga, S
Ikeda, M
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Res Ctr, Hodogaya Ku, Yokohama, Kanagawa 240, Japan
Sony Corp, Res Ctr, Hodogaya Ku, Yokohama, Kanagawa 240, Japan
Ikeda, M
Kawai, H
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Res Ctr, Hodogaya Ku, Yokohama, Kanagawa 240, Japan
Sony Corp, Res Ctr, Hodogaya Ku, Yokohama, Kanagawa 240, Japan
Kawai, H
JOURNAL OF CRYSTAL GROWTH,
1998,
195
(1-4)
: 280
-
285
[36]
OPTIMIZATION OF A LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION REACTOR FOR THE DEPOSITION OF THIN-FILMS
SETALVAD, T
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV TEXAS,DEPT CHEM ENGN,AUSTIN,TX 78712
UNIV TEXAS,DEPT CHEM ENGN,AUSTIN,TX 78712
SETALVAD, T
TRACHTENBERG, I
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV TEXAS,DEPT CHEM ENGN,AUSTIN,TX 78712
UNIV TEXAS,DEPT CHEM ENGN,AUSTIN,TX 78712
TRACHTENBERG, I
BEQUETTE, BW
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV TEXAS,DEPT CHEM ENGN,AUSTIN,TX 78712
UNIV TEXAS,DEPT CHEM ENGN,AUSTIN,TX 78712
BEQUETTE, BW
EDGAR, TF
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV TEXAS,DEPT CHEM ENGN,AUSTIN,TX 78712
UNIV TEXAS,DEPT CHEM ENGN,AUSTIN,TX 78712
EDGAR, TF
INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH,
1989,
28
(08)
: 1162
-
1170
[37]
LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TITANIUM SILICIDE
TEDROW, PK
论文数:
0
引用数:
0
h-index:
0
TEDROW, PK
ILDEREM, V
论文数:
0
引用数:
0
h-index:
0
ILDEREM, V
REIF, R
论文数:
0
引用数:
0
h-index:
0
REIF, R
APPLIED PHYSICS LETTERS,
1985,
46
(02)
: 189
-
191
[38]
LOW-PRESSURE SELECTIVE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN
GREEN, ML
论文数:
0
引用数:
0
h-index:
0
机构:
AT&T BELL LABS,MURRAY HILL,NJ 07974
AT&T BELL LABS,MURRAY HILL,NJ 07974
GREEN, ML
LEVY, RA
论文数:
0
引用数:
0
h-index:
0
机构:
AT&T BELL LABS,MURRAY HILL,NJ 07974
AT&T BELL LABS,MURRAY HILL,NJ 07974
LEVY, RA
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1984,
131
(08)
: C313
-
C313
[39]
LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TANTALUM SILICIDE
REYNOLDS, GJ
论文数:
0
引用数:
0
h-index:
0
机构:
VARIAN ASSOCIATES,VARIAN RES CTR,PALO ALTO,CA 94303
VARIAN ASSOCIATES,VARIAN RES CTR,PALO ALTO,CA 94303
REYNOLDS, GJ
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1986,
133
(08)
: C314
-
C314
[40]
PHYSICAL-PROPERTIES OF CDTE GROWN ON SI BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION
LIN, MS
论文数:
0
引用数:
0
h-index:
0
机构:
NATL TSING HUA UNIV,DEPT CHEM ENGN,HSINCHU 300,TAIWAN
NATL TSING HUA UNIV,DEPT CHEM ENGN,HSINCHU 300,TAIWAN
LIN, MS
CHOU, RL
论文数:
0
引用数:
0
h-index:
0
机构:
NATL TSING HUA UNIV,DEPT CHEM ENGN,HSINCHU 300,TAIWAN
NATL TSING HUA UNIV,DEPT CHEM ENGN,HSINCHU 300,TAIWAN
CHOU, RL
CHOU, KS
论文数:
0
引用数:
0
h-index:
0
机构:
NATL TSING HUA UNIV,DEPT CHEM ENGN,HSINCHU 300,TAIWAN
NATL TSING HUA UNIV,DEPT CHEM ENGN,HSINCHU 300,TAIWAN
CHOU, KS
JOURNAL OF CRYSTAL GROWTH,
1986,
77
(1-3)
: 475
-
479
←
1
2
3
4
5
→