UV OZONE CLEANING OF SILICON SUBSTRATES IN SILICON MOLECULAR-BEAM EPITAXY

被引：90

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作者：

TABE, M

机构：

来源：

APPLIED PHYSICS LETTERS | 1984年 / 45卷 / 10期

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D O I：

10.1063/1.95019

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1073 / 1075

页数：3

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