MODELING OF DEFORMATIONS OF PHOTOLITHOGRAPHIC OBJECTS

被引：0

作者：

Touati, A. ^{[1
]}

Corbel, S. ^{[1
]}

Corriou, J. P. ^{[2
]}

机构：

[1] DCPR CNRS ENSIC INPL, 1 Rue Grandville,BP 20451, F-54001 Nancy, France

[2] LSGC CNRS ENSIC INPL, F-54001 Nancy, France

来源：

MULTIDISCIPLINE MODELING IN MATERIALS AND STRUCTURES | 2008年 / 4卷 / 01期

关键词：

Photolithography; polymerization; shrinkage; prototyping;

D O I：

10.1163/157361108783470414

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Photolithography allows the fabrication of a solid polymer object through polymerization of a monomer resin by means of a laser source guided according to the data of computer aided design. However, one drawback of this method is the inaccuracy of the dimensions of the objects related to the shrinkage phenomenon which depends on the polymerization, on the laser flux and on the used sweeping procedure. In this paper, the deformation of an isolated voxel (elementary volume) or a voxel interacting with its neighbor is described. This simulation is based on a kinetic model that takes into account the gel effect and a model of volumetric variation due to the difference of the length of the bonds between the monomer and polymer molecules.

引用

页码：89 / 104

页数：16

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