INSITU STUDIES OF ION IRRADIATION EFFECTS IN AN ELECTRON-MICROSCOPE

被引：28

作者：

VETRANO, JS ^{[1
]}

BENCH, MW ^{[1
]}

ROBERTSON, IM ^{[1
]}

KIRK, MA ^{[1
]}

机构：

[1] ARGONNE NATL LAB,DIV MAT SCI,ARGONNE,IL 60439

来源：

METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE | 1989年 / 20卷 / 12期

关键词：

D O I：

10.1007/BF02670160

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2673 / 2680

页数：8

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[1] ADAPTATION OF AN ION IMPLANTER ON A 100 KV ELECTRON-MICROSCOPE FOR INSITU IRRADIATION EXPERIMENTS
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[J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1978, 11 (11): : 1125 - 1128
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