Stacking-dependent exchange bias in two-dimensional ferromagnetic/antiferromagnetic bilayers
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作者:
李慧平
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International Center for Quantum Design of Functional Materials (ICQD),Hefei National Research Center for Physical Sciences at the Microscale,University of Science and Technology of China
Department of Physics,University of Science and Technology of ChinaInternational Center for Quantum Design of Functional Materials (ICQD),Hefei National Research Center for Physical Sciences at the Microscale,University of Science and Technology of China
李慧平
[1
,2
]
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潘帅唯
[2
]
王喆
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Department of Physics,Southern University of Science and TechnologyInternational Center for Quantum Design of Functional Materials (ICQD),Hefei National Research Center for Physical Sciences at the Microscale,University of Science and Technology of China
王喆
[3
]
向斌
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Department of Materials Science & Engineering,University of Science and Technology of ChinaInternational Center for Quantum Design of Functional Materials (ICQD),Hefei National Research Center for Physical Sciences at the Microscale,University of Science and Technology of China
向斌
[4
]
朱文光
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International Center for Quantum Design of Functional Materials (ICQD),Hefei National Research Center for Physical Sciences at the Microscale,University of Science and Technology of China
Department of Physics,University of Science and Technology of ChinaInternational Center for Quantum Design of Functional Materials (ICQD),Hefei National Research Center for Physical Sciences at the Microscale,University of Science and Technology of China
朱文光
[1
,2
]
机构:
[1] International Center for Quantum Design of Functional Materials (ICQD),Hefei National Research Center for Physical Sciences at the Microscale,University of Science and Technology of China
[2] Department of Physics,University of Science and Technology of China
[3] Department of Physics,Southern University of Science and Technology
[4] Department of Materials Science & Engineering,University of Science and Technology of China
A clear microscopic understanding of exchange bias is crucial for its application in magnetic recording, and further progress in this area is desired. Based on the results of our first-principles calculations and Monte Carlo simulations,we present a theoretical proposal for a stacking-dependent exchange bias in two-dimensional compensated van der Waals ferromagnetic/antiferromagnetic bilayer heterostructures. The exchange bias effect emerges in stacking registries that accommodate inhomogeneous interlayer magnetic interactions between the ferromagnetic layer and different spin sublattices of the antiferromagnetic layer. Moreover, the on/off switching and polarity reversal of the exchange bias can be achieved by interlayer sliding, and the strength can be modulated using an external electric field. Our findings push the limits of exchange bias systems to extreme bilayer thickness in two-dimensional van der Waals heterostructures, potentially stimulating new experimental investigations and applications.
机构:
Univ Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54506 Vandoeuvre Les Nancy, FranceUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54506 Vandoeuvre Les Nancy, France
Moritz, J.
Bacher, P.
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Univ Lorraine, ESSTIN, F-54519 Vandoeuvre Les Nancy, FranceUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54506 Vandoeuvre Les Nancy, France
Bacher, P.
Dieny, B.
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UJF, CEA INAC, Grenoble INP, SPINTEC,CEA,CNRS, F-38054 Grenoble, FranceUniv Lorraine, Inst Jean Lamour, CNRS, UMR 7198, F-54506 Vandoeuvre Les Nancy, France
机构:
Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R ChinaNanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China
Hu, JG
Jin, GJ
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Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R ChinaNanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China
Jin, GJ
Ma, YQ
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Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R ChinaNanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China
机构:
Univ Lorraine, Inst Jean Lamour, UMR CNRS 7198, Bd Aiguillettes,BP 70239, F-54506 Vandoeuvre Les Nancy, FranceUniv Lorraine, Inst Jean Lamour, UMR CNRS 7198, Bd Aiguillettes,BP 70239, F-54506 Vandoeuvre Les Nancy, France
Moritz, J.
Bacher, P.
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机构:
Univ Lorraine, ESSTIN, 2 Rue Jean Lamour, F-54519 Vandoeuvre Les Nancy, FranceUniv Lorraine, Inst Jean Lamour, UMR CNRS 7198, Bd Aiguillettes,BP 70239, F-54506 Vandoeuvre Les Nancy, France
Bacher, P.
Dieny, B.
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机构:
Univ Grenoble Alpes, INAC SPINTEC, F-38000 Grenoble, France
CEA, INAC SPINTEC, F-38000 Grenoble, France
CNRS, SPINTEC, F-38000 Grenoble, FranceUniv Lorraine, Inst Jean Lamour, UMR CNRS 7198, Bd Aiguillettes,BP 70239, F-54506 Vandoeuvre Les Nancy, France
机构:
Hebei Normal Univ, Coll Phys, Hebei Key Lab Photophys Res & Applicat, Shijiazhuang 050024, Peoples R ChinaHebei Normal Univ, Coll Phys, Hebei Key Lab Photophys Res & Applicat, Shijiazhuang 050024, Peoples R China
Gao, Zhen
Ma, Fengxian
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Hebei Normal Univ, Coll Phys, Hebei Key Lab Photophys Res & Applicat, Shijiazhuang 050024, Peoples R ChinaHebei Normal Univ, Coll Phys, Hebei Key Lab Photophys Res & Applicat, Shijiazhuang 050024, Peoples R China
Ma, Fengxian
Wu, Hongbo
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Yangzhou Polytech Inst, Sch Sci, Yangzhou 225127, Peoples R ChinaHebei Normal Univ, Coll Phys, Hebei Key Lab Photophys Res & Applicat, Shijiazhuang 050024, Peoples R China
Wu, Hongbo
Meng, Weizhen
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机构:
Hebei Normal Univ, Coll Phys, Hebei Key Lab Photophys Res & Applicat, Shijiazhuang 050024, Peoples R ChinaHebei Normal Univ, Coll Phys, Hebei Key Lab Photophys Res & Applicat, Shijiazhuang 050024, Peoples R China
Meng, Weizhen
Jiao, Yalong
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Hebei Normal Univ, Coll Phys, Hebei Key Lab Photophys Res & Applicat, Shijiazhuang 050024, Peoples R ChinaHebei Normal Univ, Coll Phys, Hebei Key Lab Photophys Res & Applicat, Shijiazhuang 050024, Peoples R China