Synthesis of carbon tubes using microwave plasma-assisted chemical vapor deposition

被引:0
|
作者
Qing Zhang
S. F. Yoon
J. Ahn
Bo Gan Rusli
Ming-Bin Yu
机构
[1] Nanyang Technological University,Microelectronics Centre
来源
关键词
D O I
暂无
中图分类号
学科分类号
摘要
Carbon tubes were successfully produced using microwave plasma-enhanced chemical vapor deposition on silicon, quartz, and ceramic substrates. The carbon tubes, about 80–100 nm in diameter and a few tens of microns in length, were formed under methane and hydrogen plasma at 720 °C with the aid of iron oxide particles. In this approach, an average tube density of about 109 cm−2 was obtained. The crooked and nonuniform diameters of some tubes suggested that they were composed of incompletely crystallized graphitic shells due to existing defects. The characteristic of the tubes grown upward on the silicon substrate accounted for a remarkably large electron field emission current of 0.1 mA/cm2 from the surface of the tube sample at a low turn-on field of 3 V/μm.
引用
收藏
页码:1749 / 1753
页数:4
相关论文
共 50 条
  • [1] Synthesis of carbon tubes using microwave plasma-assisted chemical vapor deposition
    Zhang, Q
    Yoon, SF
    Ahn, J
    Gan, B
    Rusli
    Yu, MB
    [J]. JOURNAL OF MATERIALS RESEARCH, 2000, 15 (08) : 1749 - 1753
  • [2] Synthesis of carbon nanotubes by ECR plasma-assisted chemical vapor deposition
    Patra, S. K.
    Rao, G. Mohan
    [J]. INTERNATIONAL JOURNAL OF NANOSCIENCE, VOL 3, NO 6, 2004, 3 (06): : 845 - 851
  • [3] Synthesis of carbon nanotubes by ECR plasma-assisted chemical vapor deposition
    Patra, SK
    Rao, GM
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2005, 80 (05): : 1113 - 1115
  • [4] Synthesis of carbon nanotubes by ECR plasma-assisted chemical vapor deposition
    S.K. Patra
    G. Mohan Rao
    [J]. Applied Physics A, 2005, 80 : 1113 - 1115
  • [5] Synthesis of ultrananocrystalline diamond films by microwave plasma-assisted chemical vapor deposition
    Tran, Dzung T.
    Huang, Wen-Shin
    Asmussen, Jes
    Grotjohn, Timothy A.
    Reinhard, Donnie K.
    [J]. NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY, 2006, 16 (06): : 281 - 294
  • [6] Microwave plasma-assisted chemical vapor deposition for growing diamondss
    Bénédic, F
    Bougdira, J
    [J]. VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 2001, 56 (300): : 307 - +
  • [7] Microwave plasma-assisted chemical vapor deposition of porous carbon film as supercapacitive electrodes
    Wu, Ai-Min
    Feng, Chen-Chen
    Huang, Hao
    Camacho, Ramon Alberto Paredes
    Gao, Song
    Lei, Ming-Kai
    Cao, Guo-Zhong
    [J]. APPLIED SURFACE SCIENCE, 2017, 409 : 261 - 269
  • [8] Growth mechanism of carbon nanotubes grown by microwave plasma-assisted chemical vapor deposition
    Muneyoshi, T
    Okai, M
    Yaguchi, T
    Sasaki, S
    [J]. NANONETWORK MATERIALS: FULLERENES, NANOTUBES AND RELATED SYSTEMS, 2001, 590 : 43 - 46
  • [9] PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION IN A TUNABLE MICROWAVE CAVITY
    SALVADORI, MC
    MAMMANA, VP
    MARTINS, OG
    DEGASPERI, FT
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 1995, 4 (03): : 489 - 494
  • [10] Isotopic enrichment of diamond using microwave plasma-assisted chemical vapor deposition with high carbon conversion efficiency
    Teraji, Tokuyuki
    [J]. THIN SOLID FILMS, 2014, 557 : 231 - 236