Compression of Gain in n-Channel MESFET for MIMO Applications

被引:0
|
作者
Umamaheshwar Soma
机构
[1] Department of Electronics and Communication Engineering,
[2] Kakatiya Institute of Technology & Science,undefined
来源
Silicon | 2022年 / 14卷
关键词
MESFET; MIMO; Electrical performance; Gain compression; Output power;
D O I
暂无
中图分类号
学科分类号
摘要
A new n-channel recessed Metal semiconductor field effect transistor (MESFET) with different materials is designed for high power applications in Multi Input Multi Output (MIMO) systems in this paper. Based on material properties and electrical characteristics of MESFET, a SPICE model of the proposed device is developed. For high performance power switches, the power MESFETs are used in most of the applications. The employability of the technology is validated by the electrical measurements of the device. The operational mechanism has been shown by the characterizations done on the proposed device. To optimize the electrical performance, the contact resistance technique has to be enhanced. In this work, the output power and Gain compression of proposed n-channel MESFET at 100 MHz and 1 GHz for high input power is obtained. The output power at fundamental frequency of operation for high input power is also obtained.
引用
收藏
页码:9669 / 9673
页数:4
相关论文
共 50 条
  • [41] Analysis and design of vertical n-channel IGBT
    Central Electronics Engineering, Research Inst, Rajasthan, India
    IEEE Int Conf Semocond Electron Proc ICSE, (235-239):
  • [42] N-channel parity-time symmetry
    Ozgun, Ege
    EPL, 2023, 144 (03)
  • [43] THE RESPONSE OF N-CHANNEL EPROMS TO RADIATION AND ANNEALING
    BHAVE, PS
    BHORASKAR, VN
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1995, 103 (02): : 223 - 228
  • [44] SEGR and SEB in N-channel power MOSFETs
    Allenspach, M
    Dachs, C
    Johnson, GH
    Schrimpf, RD
    Lorfevre, E
    Palau, JM
    Brews, JR
    Galloway, KF
    Titus, JL
    Wheatley, CF
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1996, 43 (06) : 2927 - 2931
  • [45] Modification of acenes for n-channel OFET materials
    Lakshminarayana, Arun Naibi
    Ong, Albert
    Chi, Chunyan
    JOURNAL OF MATERIALS CHEMISTRY C, 2018, 6 (14) : 3551 - 3563
  • [46] Pneumatically actuated positive gain microvalve with n-channel metal-oxide semiconductor-like behaviour
    Perdigones, F.
    Luque, A.
    Quero, J. M.
    MICRO & NANO LETTERS, 2011, 6 (06) : 363 - 365
  • [47] Bisacenaphthopyrazinoquinoxaline derivatives: synthesis, physical properties and applications as semiconductors for n-channel field effect transistors
    Tong, Chenhua
    Chang, Jingjing
    Tan, Jun Min
    Dai, Gaole
    Huang, Kuo-Wei
    Chan, Hardy Sze On
    Chi, Chunyan
    ORGANIC & BIOMOLECULAR CHEMISTRY, 2013, 11 (34) : 5683 - 5691
  • [48] Characteristics of n-Channel MOSFETs With Tailored Source/Drain Extension for Mask ROM and EEPROM Applications
    Chen, Yuan-Feng
    Gong, Jeng
    Tung, Wei-Jen
    Chou, Shang-Wei
    Jeng, Erik S.
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2009, 56 (09) : 2099 - 2106
  • [50] N-CHANNEL OR P-CHANNEL MOS - TAKE YOUR PICK
    MAITLAND, D
    ELECTRONICS, 1970, 43 (16): : 79 - &