Formation of Zn Films by Magnetron Sputtering on Glass, Quartz and Silicon Substrates

被引:0
|
作者
V. A. Polishchuk
V. V. Tomaev
N. B. Leonov
机构
[1] St. Petersburg University of Information Technology,
[2] Mechanics and Optics,undefined
[3] Admiral Makarov State University of Maritime and Inland Shipping,undefined
[4] St. Petersburg State University,undefined
[5] St. Petersburg Mining University,undefined
[6] Saint Petersburg State Institute of Technology (Technical University),undefined
关键词
Zn films; surface morphology; Zn nanocrystals; nuclei of a new phase;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:459 / 463
页数:4
相关论文
共 50 条
  • [31] FORMATION OF MICROCRYSTALLINITY IN HYDROGENATED SILICON FILMS DEPOSITED WITH A SIMPLE MODIFICATION OF THE MAGNETRON SPUTTERING METHOD
    BANDYOPADHYAY, AK
    SHARMA, SN
    BANERJEE, R
    BATABYAL, AK
    BARUA, AK
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1991, 10 (24) : 1468 - 1470
  • [32] Lithium insertion into silicon films produced by magnetron sputtering
    Roginskaya, Yu. E.
    Kulova, T. L.
    Skundin, A. M.
    Bruk, M. A.
    Zhikharev, E. N.
    Kal'nov, V. A.
    RUSSIAN JOURNAL OF ELECTROCHEMISTRY, 2008, 44 (09) : 992 - 1001
  • [33] Deposition and characterization of AZO thin films on flexible glass substrates using DC magnetron sputtering technique
    Xia, Yanping
    Wang, Peihong
    Shi, Shiwei
    Zhang, Miao
    He, Gang
    Lv, Jianguo
    Sun, Zhaoqi
    CERAMICS INTERNATIONAL, 2017, 43 (05) : 4536 - 4544
  • [34] Lithium insertion into silicon films produced by magnetron sputtering
    Yu. E. Roginskaya
    T. L. Kulova
    A. M. Skundin
    M. A. Bruk
    E. N. Zhikharev
    V. A. Kal’nov
    Russian Journal of Electrochemistry, 2008, 44 : 992 - 1001
  • [35] Preparation and structure characterization of cu films deposited on glass substrates by D.C. magnetron sputtering
    Gao, Li
    Hua, Yin-Qun
    Chen, Rui-Fang
    Weixi Jiagong Jishu/Microfabrication Technology, 2008, (03): : 21 - 24
  • [36] Effects of radio-frequency power on the microstructure, morphology and wetting property of the silicon oxide films on glass and polyethylene terephthalate substrates by magnetron sputtering
    Yuan, Shiue-Fen
    Chang, Li-Shin
    THIN SOLID FILMS, 2018, 662 : 123 - 128
  • [37] Reactive magnetron sputtering of N-doped carbon thin films on quartz glass for transmission photocathode applications
    Balalykin, N. I.
    Huran, J.
    Nozdrin, M. A.
    Feshchenko, A. A.
    Kobzev, A. P.
    Sasinkova, V.
    Bohacek, P.
    Arbet, J.
    20TH INTERNATIONAL SUMMER SCHOOL ON VACUUM, ELECTRON AND ION TECHNOLOGIES, 2017, 2018, 992
  • [38] A comparative study of InN growth on quartz, silicon, C-sapphire and bulk GaN substrates by RF magnetron sputtering
    Umar Bashir
    Zainuriah Hassan
    Naser M. Ahmed
    Journal of Materials Science: Materials in Electronics, 2017, 28 : 9228 - 9236
  • [39] A comparative study of InN growth on quartz, silicon, C-sapphire and bulk GaN substrates by RF magnetron sputtering
    Bashir, Umar
    Hassan, Zainuriah
    Ahmed, Naser M.
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2017, 28 (13) : 9228 - 9236
  • [40] Influence of annealing on electronic properties of thin AlN films deposited by magnetron sputtering method on silicon substrates
    Firek, P.
    Waskiewicz, M.
    Zdunek, K.
    Szmidt, J.
    Chodun, R.
    Nowakowska-Langier, K.
    PHOTONICS APPLICATIONS IN ASTRONOMY, COMMUNICATIONS, INDUSTRY, AND HIGH-ENERGY PHYSICS EXPERIMENTS 2019, 2019, 11176