Study on Precursor Distribution of a No-inner-wall Deposition Atmospheric Pressure Plasma Jet Used for Thin Film Deposition

An atmospheric pressure jet that effectively prevents inner wall deposition has been developed, and its precursor distribution and thin-film deposition characteristics have been studied. The laser scattering and fluid simulation results show that the precursor (C4H10Zn) flow out of the eight holes of the central electrode and diffuse into the discharge region. Under the action of a discharge gas (Ar) of 2 slm is blown out of the plasma jet device, and will not diffuse to the inner wall of the plasma jet device. The optical photographs of the discharge show that the site of the monomer cleavage is about 1 mm closest to the inner wall of the jet device. With optical emission spectra (OES), a large number of characteristic emission peaks of Zn and CH were detected. The pattern of the deposited film closely resembles the diffusion pattern of the precursor within the plasma jet apparatus. By investigating deposited films in different regions, the influence of precursor distribution on film morphology and composition has been studied. XPS detected films near (black film) and far (white film) from the central region, and the results showed that films near the central region contained more organic components. This plasma device offers a stable plasma plume for thin film deposition and nanoparticle preparation.