Field-Frequency Variation during Plasma-Chemical Deposition of Silicon–Carbon Films as a Method for Their Structural Modification

被引：0
|
作者：
A. I. Popov
A. D. Barinov
V. M. Yemets
M. Yu. Presnyakov
T. S. Chukanova
机构：
[1] National Research University “Moscow Power Engineering Institute”,
[2] Institute of Nanotechnology of Microelectronics,undefined
[3] Russian Academy of Sciences,undefined
[4] National Research Center “Kurchatov Institute”,undefined
来源：
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques | 2023年 / 17卷
关键词：
silicon; carbon films, modification of properties, frequency, structure, composition, morphology, electrical conductivity;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：1060 / 1064
页数：4
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