Mismatch Modeling and Simulation—A Comprehensive Approach

被引:0
|
作者
Ulrich Grünebaum
Jürgen Oehm
Klaus Schumacher
机构
[1] ZKOM GmbH,
[2] Infineon AG,undefined
[3] University of Dortmund,undefined
关键词
mismatch; simulation; modeling; correlations; fourier transform;
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暂无
中图分类号
学科分类号
摘要
This article describes a comprehensive approach to mismatch simulation and modeling as needed for integrated circuit design. Local device mismatch as well as global process variations and parameter correlations are regarded. A method for mismatch modeling based on spatial frequencies is described, which enables to overcome insufficiencies of the first order models. Measurement results are presented to demonstrate the achieved modeling precision. All models and methods mentioned here are commercially available in the simulation tool GAME (General Analysis of Mismatch Effects) which is used in the semiconductor industry since 1998.
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页码:165 / 171
页数:6
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