Al + implanted vertical 4H-SiC p-i-n diodes: Experimental and simulated forward current-voltage characteristics

被引：1
|
作者：
Nipoti R. [1 ]
Sozzi G. [2 ]
Puzzanghera M. [2 ]
Menozzi R. [2 ]
机构：
[1] CNR-IMM of Bologna, via Gobetti 101, Bologna
[2] University of Parma, Dipartimento di Ingegneria dell'Informazione, Parco Area della Scienza 181/A, Parma
来源：
MRS Advances | 2016年 / 1卷 / 54期
关键词：
annealing; electronic material; simulation;
D O I：
10.1557/adv.2016.315
中图分类号：
学科分类号：
摘要：
The temperature dependence of the forward and reverse current voltage characteristics of circular Al + implanted 4H-SiC p-i-n vertical diodes of various diameters, post implantation annealed at 1950 °C/5 min, have been used to obtain the thermal activation energies of the defects responsible of the generation and the recombination currents, as well as the area and the periphery current component of the current voltage characteristics. The former have values compatible with those of the traps associated to the carbon vacancy defect in 4H-SiC. The hypothesis that only these traps may justify the trend of the current voltage characteristics of the studied diodes has been tested by simulations in a Synopsys Sentaurus TCAD suite. © Materials Research Society 2016.
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页码：3637 / 3642
页数：5
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