Copper;
Spectroscopy;
State Physics;
Strong Increase;
Carbon Film;
D O I:
暂无
中图分类号:
学科分类号:
摘要:
A study of the nanostructure of a-C:H:Cu films by x-ray small-angle scattering, x-ray diffraction, TEM, and visible and UV spectroscopy is reported. It has been established that introduction of 9–16 at.% Cu not only decorates the original carbon fragments but produces extended (up to 4 µm in length) formations of copper-decorated strongly elongated ellipses as well. At 14–16 at.% Cu, these linear clusters represent copper nanotubes with a core made up of the original ellipses drawn in a line. It is these conducting copper formations that account primarily for the strong increase in conductivity at 12–16 at.% Cu contents in a-C:H films.
机构:
Tokyo Inst Technol, Dept Mech Eng, 2-12-1 Ookayama,Meguro Ku, Tokyo 1528552, JapanTokyo Inst Technol, Dept Mech Eng, 2-12-1 Ookayama,Meguro Ku, Tokyo 1528552, Japan
Umada, Naoki
Kanda, Kazuhiro
论文数: 0引用数: 0
h-index: 0
机构:
Univ Hyogo, LASTI, 3-1-2 Koto, Ako, Hyogo 6781205, JapanTokyo Inst Technol, Dept Mech Eng, 2-12-1 Ookayama,Meguro Ku, Tokyo 1528552, Japan
Kanda, Kazuhiro
Niibe, Masato
论文数: 0引用数: 0
h-index: 0
机构:
Univ Hyogo, LASTI, 3-1-2 Koto, Ako, Hyogo 6781205, Japan
Univ Tokyo, Inst Solid State Phys ISSP, 5-1-5 Kashiwanoha, Kashiwa, Chiba 2278581, JapanTokyo Inst Technol, Dept Mech Eng, 2-12-1 Ookayama,Meguro Ku, Tokyo 1528552, Japan
机构:
Pontificia Univ Catolica Rio de Janeiro, Dept Fis, BR-22452900 Rio De Janeiro, BrazilPontificia Univ Catolica Rio de Janeiro, Dept Fis, BR-22452900 Rio De Janeiro, Brazil
Freire, Fernando L., Jr.
CARBON: THE FUTURE MATERIAL FOR ADVANCED TECHNOLOGY APPLICATIONS,
2006,
100
: 217
-
238
机构:
National Microelectronics Research Centre, University College, Lee Maltings, Cork, IrelandSurface Engineering Group, Materials Technology Department, Enterprise Ireland, Glasnevin, Dublin 9, Ireland