The influence of residual stress in optical windows on ellipsometric measurements

被引：0
|
作者：
V. A. Shvets
机构：
[1] Russian Academy of Sciences,Institute of Semiconductor Physics, Siberian Branch
来源：
Optoelectronics, Instrumentation and Data Processing | 2008年 / 44卷 / 2期
关键词：
Residual Stress; Optical Window; Ellipsometric Measurement; Ellipsometric Parameter; Residual Birefringence;
D O I：
10.3103/S8756699008020143
中图分类号：
学科分类号：
摘要：
The influence of the residual birefringence in optical windows on the results of ellipsometric measurements is considered. The optical properties of the windows are described by a complex relative transmittance. Corrections to the ellipsometric parameters, which arise in measuring on static ellipsometers, are calculated under the assumption of weak window anisotropy in a linear approximation. Analysis of the obtained relationships shows that the corrections are partly averaged in two-zone measurements. It is found that the optimal position of the windows corresponds to orientation of their optic axes at an angle of 45° relative to the light incidence plane.
引用
收藏
页码：183 / 188
页数：5
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