The influence of residual stress in optical windows on ellipsometric measurements

被引：0
|
作者：
V. A. Shvets
机构：
[1] Russian Academy of Sciences,Institute of Semiconductor Physics, Siberian Branch
来源：
Optoelectronics, Instrumentation and Data Processing | 2008年 / 44卷 / 2期
关键词：
Residual Stress; Optical Window; Ellipsometric Measurement; Ellipsometric Parameter; Residual Birefringence;
D O I：
10.3103/S8756699008020143
中图分类号：
学科分类号：
摘要：
The influence of the residual birefringence in optical windows on the results of ellipsometric measurements is considered. The optical properties of the windows are described by a complex relative transmittance. Corrections to the ellipsometric parameters, which arise in measuring on static ellipsometers, are calculated under the assumption of weak window anisotropy in a linear approximation. Analysis of the obtained relationships shows that the corrections are partly averaged in two-zone measurements. It is found that the optimal position of the windows corresponds to orientation of their optic axes at an angle of 45° relative to the light incidence plane.
引用
收藏
页码：183 / 188
页数：5
相关论文
共 50 条
  • [1] The Influence of Residual Stress in Optical Windows on Ellipsometric Measurements
    Shvets, V. A.
    OPTOELECTRONICS INSTRUMENTATION AND DATA PROCESSING, 2008, 44 (02) : 183 - 188
  • [2] Plasticity and stress heterogeneity influence on mechanical stress relaxation residual stress measurements
    Kim, H. K.
    Pavier, M. J.
    Shterenlikht, A.
    RESIDUAL STRESSES IX, 2014, 996 : 249 - 255
  • [3] THE INFLUENCE OF CRYSTALLOGRAPHIC TEXTURE ON DIFFRACTION MEASUREMENTS OF RESIDUAL-STRESS
    VANHOUTTE, P
    DEBUYSER, L
    ACTA METALLURGICA ET MATERIALIA, 1993, 41 (02): : 323 - 336
  • [4] Residual stress determination by optical interferometric measurements of hole diameter increments
    Pisarev, Vladimir
    Odintsev, Igor
    Eleonsky, Svyatoslav
    Apalkov, Andrey
    OPTICS AND LASERS IN ENGINEERING, 2018, 110 : 437 - 456
  • [5] COMPARISON OF OPTICAL AND FRACTOGRAPHIC MEASUREMENTS OF RESIDUAL-STRESS IN GLASS RODS
    MECHOLSKY, JJ
    DREXHAGE, MG
    AMERICAN CERAMIC SOCIETY BULLETIN, 1979, 58 (03): : 378 - 378
  • [6] Residual Stress Monitoring for ITER Diagnostic Windows
    Sengupta, Ramonika
    Kempenaars, Mark
    Jagannathan, Govindarajan
    Pak, Sunil
    Bhatt, Praghnesh
    IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 2021, 70
  • [7] The influence of the macroscopic surface topography on spatially resolved residual stress measurements
    Tönshoff, HK
    Plöger, J
    ECRS 6: PROCEEDINGS OF THE 6TH EUROPEAN CONFERENCE ON RESIDUAL STRESSES, 2002, 404-7 : 317 - 321
  • [8] UNCERTAINTY IN RESIDUAL STRESS MEASUREMENTS
    Goudar, D. M.
    Hossain, S.
    Truman, C. E.
    Smith, D. J.
    PROCEEDINGS OF THE ASME PRESSURE VESSELS AND PIPING CONFERENCE - 2008, VOL 6, PT A AND B, 2009, : 383 - 390
  • [9] Measurements of the ellipsometric parameters of optical components inside an active laser
    Holzapfel, W
    NeuschaeferRube, S
    INTERNATIONAL SYMPOSIUM ON POLARIZATION ANALYSIS AND APPLICATIONS TO DEVICE TECHNOLOGY, 1996, 2873 : 133 - 136
  • [10] THEORY OF OPTICAL ELLIPSOMETRIC MEASUREMENTS FROM MUSCLE DIFFRACTION STUDIES
    YEH, Y
    BASKIN, RJ
    BIOPHYSICAL JOURNAL, 1988, 54 (02) : 205 - 218
12345