Implantation of Silicon Ions into Sapphire: Low Doses

被引：0
|
作者：
N. E. Belova
S. G. Shemardov
S. S. Fanchenko
E. A. Golovkova
O. A. Kondratev
机构：
[1] National Research Center “Kurchatov Institute”,
来源：
Semiconductors | 2020年 / 54卷
关键词：
ion implantation; sapphire; nanoparticles; precipitates; X-ray diffraction analysis; reflectometry;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
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页码：912 / 915
页数：3
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