MoS2 Heterojunctions by Thickness Modulation

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作者
Mahmut Tosun
Deyi Fu
Sujay B. Desai
Changhyun Ko
Jeong Seuk Kang
Der-Hsien Lien
Mohammad Najmzadeh
Sefaattin Tongay
Junqiao Wu
Ali Javey
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[1] Electrical Engineering and Computer Sciences,Materials Sciences Division
[2] University of California,Department of Materials Science and Engineering
[3] Lawrence Berkeley National Laboratory,undefined
[4] Berkeley Sensor and Actuator Center,undefined
[5] University of California,undefined
[6] University of California,undefined
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In this work, we report lateral heterojunction formation in as-exfoliated MoS2 flakes by thickness modulation. Kelvin probe force microscopy is used to map the surface potential at the monolayer-multilayer heterojunction and consequently the conduction band offset is extracted. Scanning photocurrent microscopy is performed to investigate the spatial photocurrent response along the length of the device including the source and the drain contacts as well as the monolayer-multilayer junction. The peak photocurrent is measured at the monolayer-multilayer interface, which is attributed to the formation of a type-I heterojunction. The work presents experimental and theoretical understanding of the band alignment and photoresponse of thickness modulated MoS2 junctions with important implications for exploring novel optoelectronic devices.
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