Microstructural and electrical properties evaluation of lead doped tin sulfide thin films

被引:0
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作者
S. Sebastian
I. Kulandaisamy
S. Valanarasu
I. S. Yahia
Hyun-Seok Kim
Dhanasekaran Vikraman
机构
[1] Arul Anandar College,PG & Research Department of Physics
[2] Karumathur,Advanced Functional Materials & Optoelectronics Laboratory (AFMOL), Department of Physics, Faculty of Science
[3] King Khalid University,Nanoscience Laboratory for Environmental and Bio
[4] Ain Shams University,medical Applications (NLEBA), Physics Department, Faculty of Education
[5] Roxy,Division of Electronics and Electrical Engineering
[6] Dongguk University-Seoul,undefined
关键词
SnS:Pb; Thin film; XRD; Microstructural; Resistivity; p–n junction;
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学科分类号
摘要
A low cost and simple spray methodology with nebulizer was employed to fabricate lead doped tin sulfide (SnS:Pb) thin films. Different doping weight percentages (1, 3, 5, 7, and 9 wt%) were used to prepare SnS:Pb thin films on glass substrates with 350 °C substrate temperature, and we subsequently investigated Pb element influence on microstructural, electrical, and optical properties. Structural studies using X-ray diffraction confirmed orthorhombic crystal structure with (111) plane preferred orientation and atomic force micrographs identified significant variation due to the different Pb wt%. Photoluminescence showed a strong band edge emission peak at 761 nm, with optical band gaps at 1.90–1.60 eV over the Pb dopant concentrations. Hall effect showed low electrical resistivity (3.01 × 10−2 Ω cm), high carrier concentration (~1.01 × 1019 cm−3), and high Hall mobility (~20.5 cm2 V−1 s−1) for 7 wt%, which is suitable to fabricate solar cell devices. The p–n junction properties were analyzed under dark and illumination conditions by current–voltage characteristics using the FTO/n-CdS/p-SnS:Pb/Al structure.
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页码:52 / 61
页数:9
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