A strained organic field-effect transistor with a gate-tunable superconducting channel

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作者
Hiroshi M. Yamamoto
Masaki Nakano
Masayuki Suda
Yoshihiro Iwasa
Masashi Kawasaki
Reizo Kato
机构
[1] Research Center of Integrative Molecular Systems (CIMoS),Division of Functional Molecular Systems
[2] Institute for Molecular Science,Quantum Phase Electronics Center and Department of Applied Physics
[3] RIKEN ,undefined
[4] JST,undefined
[5] PRESTO (Precursory Research for Embryonic Science and Technology),undefined
[6] Institute for Materials Research,undefined
[7] Tohoku University,undefined
[8] RIKEN Center for Emergent Matter Science (CEMS),undefined
[9] School of Engineering,undefined
[10] The University of Tokyo,undefined
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摘要
In state-of-the-art silicon devices, mobility of the carrier is enhanced by the lattice strain from the back substrate. Such an extra control of device performance is significant in realizing high-performance computing and should be valid for electric-field-induced superconducting (SC) devices, too. However, so far, the carrier density is the sole parameter for field-induced SC interfaces. Here we show an active organic SC field-effect transistor whose lattice is modulated by the strain from the substrate. The soft organic lattice allows tuning of the strain by a choice of the back substrate to make an induced SC state accessible at low temperature with a paraelectric solid gate. An active three-terminal Josephson junction device thus realized is useful both in advanced computing and in elucidating a direct connection between filling-controlled and bandwidth-controlled SC phases in correlated materials.
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