A Study on Uniformity Characteristics of a Magnetized Inductively Coupled Plasma

被引：0
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作者：
Woohyun Hee-Woon Cheong
Ji-Won Lee
Sujin Kim
Kyoungji Cha
Hwally Kim
机构：
[1] Graduate School of Management of Technology,
[2] Hoseo University,undefined
[3] Samsung Electronics Co. Ltd.,undefined
[4] Department of Applied Statistics,undefined
[5] Hoseo University,undefined
[6] Department of Electrical and Computer Engineering,undefined
[7] Seoul National University,undefined
[8] Hyundai Motor Company,undefined
来源：
Plasma Physics Reports | 2020年 / 46卷
关键词：
M-ICP; plasma; magnetic flux density; ion flux; uniformity;
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页码：328 / 335
页数：7
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