Wide range applications of process plasma diagnostics using vacuum ultraviolet absorption spectroscopy

被引:6
|
作者
Takeda, Keigo [1 ]
Ishikawa, Kenji [2 ]
Hori, Masaru [2 ]
机构
[1] Meijo Univ, Dept Elect & Elect Engn, 1 501 Shiogamaguchi,Tempaku Ku, Nagoya, Aichi 4688502, Japan
[2] Nagoya Univ, Ctr Low Temp Plasma Sci, Furo Cho,Chikusa Ku, Nagoya, Aichi 4648603, Japan
关键词
Plasma process; Vacuum ultraviolet absorption spectroscopy; Atomic species; Absolute density; Surface loss probability; ABSOLUTE DENSITY-MEASUREMENTS; BACILLUS-SUBTILIS SPORES; HOLLOW-CATHODE LAMP; ATMOSPHERIC-PRESSURE; DIELECTRIC FILM; WALL CONDITIONS; HYDROGEN-ATOMS; E; COLI; RADICALS; DISCHARGE;
D O I
10.1007/s41614-022-00075-3
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Applications of plasma diagnostics using vacuum ultraviolet absorption spectroscopy (VUVAS) in our studies are summarized in this article. The plasma diagnostics with absorption spectroscopy is a powerful tool for investigating behaviors of reactive species in plasma processes, because it enables us to measure the absolute density. In our group, we have focused on the clarification of reaction mechanisms of atomic species in the plasma processes, and the behaviors of atomic species generated in various process plasmas have been investigated using the VUVAS with a plasma light source. Using the VUVAS, we can investigate not only the absolute density but also surface reactions of atomic species in the plasma processes. On the other hand, in our group, the real-time monitoring of atomic species based on VUVAS has been realized in the plasma processes, and the effects of the initial state of reactor wall surface on the behaviors of atomic species in a process plasma have been quantitatively investigated. Moreover, the VUVAS has been applied to the measurements of reactive species generated by atmospheric pressure plasmas which attracts much attention because of its applications to the bio and medical research fields. These results and experimental technique used in our studies are extremely useful for the further developments of plasma processes such as etching, deposition, surface modification, bio-medical applications and so on in the future.
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页数:32
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