Si–Si optical phonon behavior in localized Si clusters of SixGe1−x alloy nanocrystals

被引:0
|
作者
L. Z. Liu
X. L. Wu
Y. M. Yang
T. H. Li
Paul K. Chu
机构
[1] Nanjing University,Nanjing National Laboratory of Microstructures and Department of Physics
[2] City University of Hong Kong,Department of Physics and Materials Science
来源
Applied Physics A | 2011年 / 103卷
关键词
Alloy Nanocrystals; Optical Mode Frequency; Surface Tensile Stress; Calculated Raman Spectrum; Raise Annealing Temperature;
D O I
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中图分类号
学科分类号
摘要
Raman spectra acquired from SixGe1−x-nanocrystal-embedded SiO2 films show dependence of the Si–Si optical phonon frequency on Si content. The frequency upshifts, and peak intensity increases as the silicon concentration increases. For a given Si content, the frequency remains unchanged with annealing temperature. Spectral analysis and density functional theory calculation reveal that the optical Si–Si phonon is related to the formation of localized Si clusters surrounded by Si/Ge atomic layers in the SixGe1−x nanocrystals and the intensity enhancement arises from the larger cluster size. The synergetic effect of surface tensile stress and phonon confinement determines the Si–Si optical phonon behavior.
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页码:361 / 365
页数:4
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