Concentration-Diversified Magnetic and Electronic Properties of Halogen-Adsorbed Silicene

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作者
Duy Khanh Nguyen
Ngoc Thanh Thuy Tran
Yu-Huang Chiu
Ming-Fa Lin
机构
[1] Advanced Institute of Materials Science,Laboratory of Applied Physics
[2] Ton Duc Thang University,Faculty of Applied Sciences
[3] Ton Duc Thang University,Hierarchical Green
[4] National Cheng Kung University,Energy Materials (Hi
[5] National Pingtung University,GEM) Research Center
[6] National Cheng Kung University,Department of Applied Physics
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摘要
Diverse magnetic and electronic properties of halogen-adsorbed silicene are investigated by the first-principle theoretical framework, including the adatom-diversified geometric structures, atom-dominated energy bands, spatial spin density distributions, spatial charge density distributions and its variations, and orbital-projected density of states. Also, such physical quantities are sufficient to identify similar and different features in the double-side and single-side adsorptions. The former belongs to the concentration-depended finite gap semiconductors or p-type metals, while the latter display the valence energy bands with/without spin-splitting intersecting with the Fermi level. Both adsorption types show the halogen-related weakly dispersed bands at deep energies, the adatom-modified middle-energy σ bands, and the recovery of low-energy π bands during the decrease of the halogen concentrations. Such feature-rich band structures can be verified by the angle-resolved photoemission spectroscopy experiment.
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